Joshi, UnnatiVenkatesh, VishalYamamoto, Hiromichi2023-05-232023-05-232019-03-052019-03-05https://repository.upenn.edu/handle/20.500.14332/45875This progress report describes fabrication of silicon nitride membranes from Si wafers using cleanroom techniques, and of nanopore preparation via a self-assembled PS-b-PMMA film. A 36.9 µm thick membrane is successfully prepared by KOH wet etching. The membrane is a layered structure of 36.8 µm thick Si and 116 nm thick silicon nitride. It is also exhibited that in the 47 nm thick PS-b-PMMA film, the nanopore structure is observed in the vicinity of a dust particle, but most of the area indicates lamellar domain structure. The thickness of PS-b-PMMA film will be optimized to prepare a complete nanopore template in the future work.http://creativecommons.org/licenses/by-sa/4.0/NanoporeSelf-AssemblyPS-b-PMMASilicon nitrideMembraneChemical EngineeringElectrical and Computer EngineeringEngineeringEngineering Science and MaterialsMaterials Science and EngineeringNanoscience and NanotechnologyPhysical Sciences and MathematicsReport