Metzler, MeredithLu, Yichen2023-05-232023-05-232016-04-282016-04-28https://repository.upenn.edu/handle/20.500.14332/45948This report shows deposition characteristics for aluminum oxide (Al2O3), hafnium oxide (HfO2), and titanium dioxide (TiO2) films deposited in the Cambridge Nanotech Savannah system. A brief study of the presence of pinholes in these films is also presented.Report