Plasma Enhanced Chemical Vapor Deposition (PECVD) of Silicon Nitride (SiNx) Using Oxford Instruments System 100 PECVD

Metzler, MeredithPatel, Raj2023-05-232023-05-232017-02-282016-05-07https://repository.upenn.edu/handle/20.500.14332/45950This report discusses the deposition process of SiNx using the Oxford System 100 PECVD.Nanoscience and NanotechnologyPlasma Enhanced Chemical Vapor Deposition (PECVD) of Silicon Nitride (SiNx) Using Oxford Instruments System 100 PECVDReport