Reactive Ion Etch (RIE) of Silicon Dioxide (SiO2) with Tetrafluoromethane (CF4)

Metzler, Meredith2023-05-232023-05-232016-05-072016-05-07https://repository.upenn.edu/handle/20.500.14332/45951This report discusses the CF4 etch process of SiO2 using the Oxford 80 Plus RIE.Nanoscience and NanotechnologyReactive Ion Etch (RIE) of Silicon Dioxide (SiO2) with Tetrafluoromethane (CF4)Report