Reactive Ion Etch (RIE) of Silicon Dioxide (SiO2) with Trifluoromethane and Oxygen (CHF3/O2)

Metzler, Meredith2023-05-232023-05-232016-05-072016-05-07https://repository.upenn.edu/handle/20.500.14332/45953This report discusses the CHF3/O2 etch process of SiO2 using the Oxford 80 Plus RIE.Nanoscience and NanotechnologyReactive Ion Etch (RIE) of Silicon Dioxide (SiO2) with Trifluoromethane and Oxygen (CHF3/O2)Report