Ma, MingxuanYamamoto, Hiromichi2023-05-232023-05-232020-09-252020-09-25https://repository.upenn.edu/handle/20.500.14332/45885This report describes the fabrication of a long-range orderly nanopore structure in free-standing siliconnitride membranes using electron-beam lithography (EBL). The parameter setting and challenges of eachstep are discussed.http://creativecommons.org/licenses/by-sa/4.0/NanoporeElectron-beam LithographySilicon NitrideEngineeringPhysical Sciences and MathematicsReport