Li, Yangshanshan2023-05-232023-05-232018-05-012018-05-01https://repository.upenn.edu/handle/20.500.14332/45960The alignment error of Elinox ELS-7500EX E-beam Lithography system is examined, as a project of Graduate Student Fellow Program. This report shows the alignment error of 60 and 30 nm in the x- and y-direction, respectively, confirming the tool specification of 60 nm alignment error.http://creativecommons.org/licenses/by-sa/4.0/alignment error Elionix ELS-7500EXEngineeringReport