Wood, Steven
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Publication MicroChem S1800 Series Resist Application onto Si(2016-02-18) Wood, Steven; LOPEZ, GERALD GThe Quattrone Nanofabrication Facility standard operating procedure for the application of MicroChem S1800 series resist onto an Si wafer is provided in this document.Publication SUSS MicroTec MA6 Gen3 – MicroChem SPR-220 7.0 Thickness vs. Dose-to-Clear and Contrast Curve Data(2016-04-27) Wood, Steven; Lopez, Gerald GThe SOP for MicroChem SPR-220 7.0 at the Quattrone Nanofabrcation Facility is provided along with thickness vs. dose-to-clear and contrast curve data. The document is intended to provide a starting point when using MicroChem SPR-220 7.0.Publication Heidelberg DWL66+ S1805 Contrast Curves(2016-02-04) Wood, Steven; Lopez, Gerald GAccurately gauge the optimal machine setting for MicroChem S1805 using the Heidelberg DWL 66+ and obtain contrast curves based on the 2mm and 10mm writehead.Publication Reactive Ion Etch (RIE) of Silicon and ZEP520A Resist Mask with Tetrafluoromethane (CF4) Using Oxford 80 Plus(2016-05-12) Wood, Steven; Lopez, Gerald G; Metzler, MeredithThis report discusses the results of etching silicon with electron beam lithography defined features in ZEP520A resist using CF4 in the Oxford 80 Plus RIE.Publication Heidelberg DWL66+ S1813 Contrast Curves(2016-02-04) Wood, Steven; LOPEZ, GERALD GAccurately gauge the optimal machine setting for MicroChem S1813 using the Heidelberg DWL 66+ and plot the contrast curves for the 2mm and 10mm writeheads.Publication SUSS MicroTec MA6 Gen3 - S1813 Contrast Curve Data(2016-03-04) Bryan, Jonathan; Wood, Steven; Lopez, Gerald GPublication SUSS MicroTec MA6 Gen3 - S1818 Contrast Curve Data(2016-03-04) Bryan, Jonathan; Wood, Steven; LOPEZ, GERALD GPublication Heidelberg DWL66+ S1818 Contrast Curves(2016-02-04) Wood, Steven; LOPEZ, GERALD GAccurately gauge the optimal machine setting for MicroChem S1818 using the Heidelberg DWL 66+ and plot the contrast curves for the 2mm and 10mm writeheads.