ZEP520A Contrast Curves

Loading...
Thumbnail Image

Related Collections

Degree type

Discipline

Subject

ZEP520A
contrast curve
o-xylene
room temperature
clearing dose
base dose
Nanoscience and Nanotechnology

Funder

Grant number

License

Copyright date

Distributor

Related resources

Contributor

Abstract

This report documents the contrast curves for the ZEP520A electron beam lithography resist from ZEON Chemicals. Dilution by weight of ZEP520A vs spin speed from 1000 to 6000 rpm was generated in previous work. The aim is to provide an approximate clearing and base dose for the ZEP520A standard process at the Singh Center for Nanotechnology.

Advisor

Date Range for Data Collection (Start Date)

Date Range for Data Collection (End Date)

Digital Object Identifier

Series name and number

Publication date

2016-12-16

Volume number

Issue number

Publisher

Publisher DOI

relationships.isJournalIssueOf

Comments

Recommended citation

Collection