Azadi, Mohsen
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Publication ZEP520A Contrast Curves(2016-12-16) Lopez, Gerald G.; Azadi, MohsenThis report documents the contrast curves for the ZEP520A electron beam lithography resist from ZEON Chemicals. Dilution by weight of ZEP520A vs spin speed from 1000 to 6000 rpm was generated in previous work. The aim is to provide an approximate clearing and base dose for the ZEP520A standard process at the Singh Center for Nanotechnology.Publication Cambridge Nanotech S200 ALD standard operating procedure(2021-10-01) Azadi, MohsenPublication ALD deposition of SiO2 using BDEAS and Ozone precursors(2021-12-01) Azadi, MohsenIn this report, the ALD process for deposition of SiO2 using BDEAS and O3 as precursors has been studied. The etch rates and uniformity of deposition at various temperatures are reported.Publication CSAR 62 Contrast Curves(2017-12-21) Azadi, Mohsen; Griggs, Georgia; de Villafranca, Glen; Lopez, GeraldPublication PMMA A2 and A4 Spin Curves(2016-12-16) Lopez, Gerald G; Azadi, MohsenThis report documents the spin curves for the PMMA A2 and A4 electron beam lithography resists from MicroChem. The aim is to provide a spin curve reference for the A2 and A4 dilutions at the Singh Center for Nanotechnolgy Quattrone Nanofabrication Facility.Publication Oxford PlasmaLab 80 Plus RIE standard operating procedure(2021-11-01) Azadi, MohsenPublication Deposition and Etch Characterization of Low Stress Silicon Nitride Films Deposited via LPCVD(2022-08-01) Azadi, MohsenPublication CSAR 62 Spin Curve(2018-12-21) Azadi, Mohsen; Griggs, Georgia; de Villafranca, Glen; Lopez, GeraldPublication Characterization of Silicon Dioxide (SiO2) and Microchem S1800 Resist Etching Using Oxford 80 Plus RIE(2016-10-06) Azadi, Mohsen; Metzler, Meredith; Lopez, Gerald GThis technical report describes the process of etching silicon dioxide (SiO2) and Microchem S1800 resist using the Oxford 80 Plus Reactive Ion Etch (RIE) system.Publication SPTS Si DRIE standard operating procedure(2021-12-01) Azadi, Mohsen