LOPEZ, GERALD G
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Publication SUSS MicroTec MA6 Gen3 – MicroChem SPR-220 7.0 Thickness vs. Dose-to-Clear and Contrast Curve Data(2016-04-27) Wood, Steven; Lopez, Gerald GThe SOP for MicroChem SPR-220 7.0 at the Quattrone Nanofabrcation Facility is provided along with thickness vs. dose-to-clear and contrast curve data. The document is intended to provide a starting point when using MicroChem SPR-220 7.0.Publication MicroChem S1800 Series Resist Application onto Si(2016-02-18) Wood, Steven; LOPEZ, GERALD GThe Quattrone Nanofabrication Facility standard operating procedure for the application of MicroChem S1800 series resist onto an Si wafer is provided in this document.Publication ZEP520A Contrast Curves(2016-12-16) Lopez, Gerald G.; Azadi, MohsenThis report documents the contrast curves for the ZEP520A electron beam lithography resist from ZEON Chemicals. Dilution by weight of ZEP520A vs spin speed from 1000 to 6000 rpm was generated in previous work. The aim is to provide an approximate clearing and base dose for the ZEP520A standard process at the Singh Center for Nanotechnology.Publication ZEP520A Spin Curves and Dilution Characterization(2016-12-16) Lopez, Gerald GSpin curves for ZEP520A from ZEON Chemicals for the Singh Center for Nanotechnology were studied under non-diluted and diluted conditions by weight.Publication PMMA A2 Contrast Curves(2016-12-16) Lopez, Gerald G.; Azadi, MohsenThis report documents the contrast curves for the PMMA A2 electron beam lithography resist from MicroChem. Spin curves for PMMA A2 can be found in previous work. The aim is to provide an approximate clearing and base dose for the PMMA A2 standard process at the Singh Center for Nanotechnology.Publication Heidelberg DWL66+ S1813 Contrast Curves(2016-02-04) Wood, Steven; LOPEZ, GERALD GAccurately gauge the optimal machine setting for MicroChem S1813 using the Heidelberg DWL 66+ and plot the contrast curves for the 2mm and 10mm writeheads.Publication CSAR 62 Spin Curve(2018-12-21) Azadi, Mohsen; Griggs, Georgia; de Villafranca, Glen; Lopez, GeraldPublication SUSS MicroTec MA6 Gen3 - S1818 Contrast Curve Data(2016-03-04) Bryan, Jonathan; Wood, Steven; LOPEZ, GERALD GPublication Elionix ELS-7500EX: Field Size Analysis(2016-12-16) Lopez, Gerald G.; Azadi, MohsenThis report documents the field distortion of the Elionix ELS-7500EX electron beam lithography system at the University of Pennsylvania Singh Center for Nanotechnology at the Quattrone Nanofabrication Facility. The system is equipped with a 20MHz fixed clock and fixed focus. The aim of the work is to understand optimal field sizes to use for critical dimensions 80nm and above. Field uniformity was analyzed as a function of critical dimension and objective lens aperture (OLA) a.k.a. final paerture. As features scale down below 300nm, they are more susceptible to the systematic effects of field distortion. Suggested field sizes depend on the feature size that is desired.Publication SUSS MicroTec MA6 Gen3 - S1805 Contrast Curve Data(2016-02-18) Bryan, Jonathan; LOPEZ, GERALD G